Plasma Enhanced Chemical Vapor Deposition (PECVD) System
Posted Date:
Feb 19, 2025
Due Date:
Feb 28, 2025
Awarded Date:
No Awarded Date
| SetAside Type | ||
| Solicitation ID | Solicitation Title | Solicitation Office |
| 5-B176-Q-00304-00 | Plasma Enhanced Chemical Vapor Deposition (PECVD) System | |
| Synopsis | ||
|
Argonne National Laboratory is seeking a provider of a Plasma Enhanced Chemical Vapor Deposition (PECVD) System that meets the technical requirements listed in the attached Statement of Work dated February 13, 2025. Argonne National Laboratory is looking for domestic manufactured items that meet the requirements of the Buy American Act, but are open to review of all technically acceptable options. Offers will be reviewed under Lowest Price, Technically Acceptable Criteria. Please provide the following with your offer no later than 5:00pm CST on February 28, 2025:
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| Office Location | Agency Name | Solicitation Base Posting Type |
| ENERGY, DEPARTMENT OF | Combined Synopsis/Solicitation | |
